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Intellectual Property Law

: TinytechIP

US patent 7466072 - Low FWHM CNTs

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a href="http://www.freepatentsonline.com/7466072.html"http://www.freepatentsonline.com/7466072.html/abr /br /a href="http://en.wikipedia.org/wiki/FWHM"Full width at half maximum /a(FWHM) diffraction is used to characterize carbon nanotubes and provide an indication of the field emission behavior for the nanotubes. This patent from Samsung includes a very basic claim to a low FWHM diffraction carbon nanotube formed via the arc discharge method and combined with glass frit, ethyl cellulose, methyl acrylic acid, and butyl carbitol acetate. Claim 1 reads:br /br /1. A carbon nanotube having a Full-Width at Half-Maximum of X-ray diffraction that is less than or equal to 0.6.br /br /However, it is not entirely clear to me how this is different from data determined by Smalley's group at Rice back in 1998 (see Fig. 6 and section 3.2 of the article "a href="http://cohesion.rice.edu/NaturalSciences/Smalley/emplibrary/APA67-29.pdf"Large-scale purification of single walled carbon nanotubes: process, product, and characterizations/a" published in Applied Physics A) which seems to disclose a FWHM of 0.1.

Full post as published by TinytechIP on December 22, 2008 (boomark / email).

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