Intellectual Property Law

US Patent 7638169 - Directed CNT growth

This patent from Intel teaches using deposited platinum patterns to guide the growth of carbon nanotubes and shape electrical interconnects or other CNT structures. Claim 1 reads:

1. A method comprising:

forming a carbon nanotube inhibitor pattern on a substrate surface, wherein the carbon nanotube inhibitor pattern includes an opening that exposes a region of the substrate surface;

forming a catalyst seed pattern over the substrate surface, wherein at least a portion of the catalyst seed pattern is on a portion of the exposed region; and

growing a carbon nanotube from the catalyst seed pattern and on the exposed region of the substrate surface,

wherein the carbon nanotube inhibitor pattern directs the growth of the carbon nanotube,

wherein the carbon nanotube inhibitor pattern comprises platinum.

Full post as published by TinytechIP on December 29, 2009 (boomark / email).