Intellectual Property Law

US Patent 7524534 - Reactive dip pen nanolithography

This patent from Nanoink teaches a dip pen nanolithography method including the provision of a chemical reaction between a compound coated on the tip and another compound on a substrate. Claim 1 reads:

1. A method of nanolithography comprising:

providing a substrate on which a first patterning compound has been applied;

providing a scanning probe microscope tip;

coating the tip with a second patterning compound; and

using the coated tip to apply the second patterning compound to the first patterning compound on the substrate via a transport medium so as to produce a desired pattern of the second patterning compound, wherein the second patterning compound reacts or combines with the first patterning compound.

Full post as published by TinytechIP on May 01, 2009 (boomark / email).