Intellectual Property Law

US Patent 7432039 - Combined molecular and non-molecular lithography

Photoresists are commonly used in semiconductor processing to define patterns for doping, etching, and other microfabrication steps. This patent from the Penn State Research Foundation
teaches combining the patterning of resists with molecular film patterning to define nanoscale structures. Claim 1 reads:

1. A method of fabricating a pattern on a surface of a substrate, said pattern comprising a plurality of features, the method comprising:

applying at least one non-molecular lithographic technique with at least one molecular lithographic technique to simultaneously define a size and shape of at least one of the features of the pattern;

wherein the applying the at least one non-molecular lithographic technique with the at least one molecular lithographic technique includes removing both a resist used in the lithographic technique and at least one molecular layers used in the at least one molecular lithographic technique to simultaneously define the size and the shape of the at least one of the features of the pattern.

Full post as published by TinytechIP on October 09, 2008 (boomark / email).